• Ultra-High Purity Design: Features a 10Ra microinch/0.25-micron surface finish to eliminate gas contamination, ensuring compliance with semiconductor, pharmaceutical, and research-grade requirements.
• High Sensitivity: Fine-tuned adjustments enable precise pressure regulation, critical for applications like analytical instrumentation and gas chromatography.
• Low Pressure Drop: Reduces energy consumption and system wear, enhancing overall efficiency in high-flow processes.
• Durability: Constructed with 316L stainless steel and optional Hastelloy® valve internals for corrosion resistance in aggressive media.

• Pressure Handling: Inlet up to 3500 psig/241 bar; outlet adjustable to 150 psig/10.3 bar.
• Leakage Resistance: UL-rated low leakage (<10⁻⁷ mbar·L/s helium) for hazardous or costly gases.
• Temperature Range: -40°C to 71°C (-40°F to 160°F) with Teflon PFA seats.

• Semiconductor Manufacturing: Gas distribution in cleanrooms and wafer fabrication.
• Laboratory Equipment: Mass spectrometry, laser systems, and gas analysis.
• Industrial Gas Handling: Cylinder cabinets, valve boxes, and specialty gas supply.

• Versatility: Adaptable to corrosive gases (e.g., NH₃, Cl₂) and inert media with customizable configurations.
• Safety: Static-dissipative design minimizes ignition risks for pyrophoric gases.
• Compliance: Meets USP Class VI, BPE, and ISO 17025 standards for biopharmaceutical and analytical workflows.

64-3600 High sensitivity series TESCOM regulator product sample reference